Experience the most innovative Atomic Layer Deposition system for optical coatings - the Leybold Optics ALD 1200, Plasma-Enhanced Spatial ALD for double-sided, ultra-uniform films on up to 8x ⌀300 mm substrates.
Experience the most innovative Atomic Layer Deposition system for optical coatings - the Leybold Optics ALD 1200, Plasma-Enhanced Spatial ALD for double-sided, ultra-uniform films on up to 8x ⌀300 mm substrates.
Our Plasma-Enhanced Spatial ALD system delivers ultra‑thin, dense, and stress-controlled coatings on micro‑structured and curved 3D substrates – double‑sided in a single pass. With high deposition rates on 8 substrates of up to 300 mm, process temperatures from 50–230°C, and a fully customizable wafer handling solutions, it combines best‑in‑class conformality with semiconductor‑grade throughput and cleanliness.
Ultra-thin conformal coatings on nano-structured and curved 3D substrates
Separation of gases not in time, but in space increases growth rates. Coupled with multi-wafer production in a single run, the highest throughput for and ALD system is achieved
Double sided coatings without flipping, reducing cycle time and particle risk
High material flexibility with efficient precursor utilization for cost‑effective scaling
OMS 6000 closed-loop control for complex multilayer stacks with repeatable results
SMIF and FOUP automated wafer handling. SEMI S2/S8 compliant. SECS:GEM compatible
Fab‑ready cleanliness with low particle levels tailored for precision optics and semiconductor lines
In-Situ optical monitoring system OMS 6000
ALD technology is the ideal solution for applications requiring ultra-uniform, pinhole-free coatings on complex structures or 3D substrates, such as highly curved lenses and structures with a high aspect ratio. It’s exceptional particle performance and low defect density make it ideal for the increasing demand for semiconductor devices and precision optics.
Proximity Sensors, Ambient Sensors, Facial Recognition, Hyperspectral Imaging, Solid State LiDAR, CIS
PICs, Metasurfaces, Augmented Reality, Waveguides, Optical Modulators, Datacom, Diffractive Optical Elements
LED, microLED, VCSEL, EEL, LCoS, OLED
Hard Masks, HAMR (Trench filling), Encapsulation, Trench Fillings, Gate Oxides
Microscopy, Endoscopy, two photon Spectroscopy
Laser Machining, Laser Patterning, Laser Beam Shaping, Laser Fusion Components, Ultrafast Optics
Smartphone and camera lenses, AR glasses
When optical quality, barrier integrity and 3D uniformity are critical, plasma enhanced spatial Atomic Layer Deposition (ALD) is the right technology. Its ability to produce dense, stress neutral films at low temperatures with precise and repeatable layer control translates directly into higher yields, longer lifetimes, and better device performance.
Spatial ALD forms thin films by repeating self-limiting surface reactions: specific precursors enter the chamber on the precursor side, chemisorbs onto the substrate surface, and are modified in the plasma zone. This cycle deposits material layer-by-layer, delivering precise thickness control and uniform, conformal coverage.
The Use of ALD coating systems in a production or R&D facility requires extensive and reliable preparation. Bühler can support you in topics like Abatement systems, Hazardous gases and chemicals, preventive maintenance and operator trainings. Please reach out to our experts to provide the optimal solution for you.
Bühler Leybold Optics is a leading supplier for thin-film vacuum coating solutions. Our sputtering coating equipment includes the cutting-edge technologies from the precision optics market, upgraded to meet the demands of the semiconductor industry, backed by experienced engineers, to optimize performance and productivity for almost any application.
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