Reactive magnetron sputtering with MF (mid frequency) is a well-established deposition technique for different kinds of layers and structures. In particular high quality optical filters with low loss and high performance can be deposited by using the PARMS and PARMS+ technology. This technology provides greater repeatability and highest optical performance.
Current and upcoming specifications for optical filters and components are driving the demand for optimized deposition techniques. Besides the need for high precision process control to achieve accurate and reproducible layer properties, additional requirements from a process automation perspective have to be considered.
The HELIOS sputtering system provides extremely accurate layer deposition and thickness control, allowing manufacture of state of the art optical components with high throughput. These include beam splitters, band pass, edge, and multi notch dielectric filters. In addition optoelectronic applications, which combine electronic components with optical filters, are growing rapidly.