The NESSY series provides coatings for extreme-ultraviolet (EUV) mirrors under ultrahigh vacuum (UHV) conditions, ideal for R&D and mass production EUV lithography, X-ray measuring devices, synchrotron radiation optics and other scientific applications.
A highly sophisticated machine design and precision manufacturing produce the ultrahigh vacuum pressure you need to deliver perfect stoichiometric film quality.
While the sputter source and deposition process provide excellent stability, the mechanical design of the NESSY series is based on minimized tolerances. This enables NESSY to bridge the gap to subatomic uniformity values necessary in, for example, EUV and other challenging optics applications.
The substrate holder has a double planetary rotation system designed to manage the substrate movement you need for highly precise uniformity. The high-speed direct substrate rotation works in combination with a low-velocity rotation around the chamber with programmable speed profiles. This allows NESSY to coat a wide range of substrate geometries to match your precise application.
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