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Technologies for high-vacuum thin-film coating applications

Deposition of layers to improve a material

Bühler Leybold Optics is one of the leading system manufacturers of high-vacuum thin-film deposition technology, whereby thin-film coating functionality is added to a substrate. This can be a moisture barrier in the case of a packaging foil, a reflective layer for a car light reflector, an anti-reflection layer, a complex filter stack for optical components, highly reflective enhanced and protected layers for astronomical mirrors, or a heat insulation layer stack for architectural glazing applications. Thin films have thicknesses ranging from nanometers to micrometers and they can be a single layer or layer stacks of several hundred layers, as can be the case with optical filters. Physical vapor deposition (PVD) with thermal or electron-beam evaporation as well as sputtering uses a rigid deposition material source. However, where our systems use chemical vapor deposition (CVD), gases or liquid material sources are used.

We offer the complete spectrum of vacuum thin-film deposition technologies, from evaporation, sputtering, plasma-enhanced chemical vapor deposition (PECVD) and enhancements of the technologies such as plasma-assisted reactive magnetron sputtering (PARMS). For mass production systems several in-situ process control systems are available. Our systems can coat tiny substrates of a few millimeters to extremely large glass panes of more the 20 m² for use in architecture. The substrates can be rigid or flexible as in food packaging or electronic capacitor manufacturing.